China's First 2D Semiconductor Process Line Operational
Chinese tech outlet IT Home reports that the nation's first 8-inch 2D semiconductor pilot line has been activated. The goal is to achieve 5nm-equivalent fabrication without EUV lithography by 2029.
Chinese technology outlet IT Home has reported the activation of the nation's first 8-inch pilot production line for 2D semiconductors. This foundational line aims to overcome key limitations in traditional chip manufacturing, specifically targeting the development of advanced semiconductor capabilities independent of Extreme Ultraviolet (EUV) lithography.
The process line, developed by Yuanjijie Technology, is now fully functional and equipped for both experimental and engineering-scale chip production. It establishes a complete engineering chain, from material preparation to chip integration, marking what the company states is the world's first such line for 2D semiconductors.
Company Chairman Bao Wenzhong highlighted the intrinsic advantage of 2D materials: their atomic-level thinness allows for transistor scaling without resorting to complex structures like FinFET or gate-all-around. This approach has the potential to simplify manufacturing and reduce costs.
The company aims to develop a pathway for 90nm-equivalent silicon processes on this 8-inch platform in the latter half of the year. The long-term objective is to enable the fabrication of 5nm-equivalent chips by 2029, entirely through domestic solutions and without reliance on EUV lithography. Additionally, Yuanjijie has released a 500-nanometer PDK version 0.1 and begun foundry services, boasting a yield exceeding 99.99%, approaching silicon-based process standards.