Chinese EUV Light Source Prototype Debuts at China Industry Expo

Chinese technology firm Landao Suiyan has showcased a prototype of its Extreme Ultraviolet (EUV) light source system for the first time at the China International Industry Fair in Shanghai. This system is considered the most advanced domestic EUV light source prototype publicly displayed and is crucial for high-end lithography machines.

The exhibited light source system boasts a 90% domestic component rate, with most core parts independently developed. The technical approach aligns with leading international manufacturers and is suitable for chip exposure testing. EUV light sources are one of three core components for manufacturing advanced chips using processes of 7nm and below. Access to this technology has long been restricted by overseas monopolies and export bans, posing a key challenge to China's self-sufficiency in high-end chip production.

Landao Suiyan's website lists several EUV products, including the high-power FlintMicro-LPP Alpha01 and the low-power FlintNano LPP-OXXO system. The FlintMicro-LPP series has undergone theoretical proof, while the FlintNano-LPP series is in the productization phase. Specifications for the FlintNano LPP-OXXO include a 1000W driving laser power, a frequency of 1 to 20 kHz, and an efficiency exceeding 2%.

While this debut marks a critical step from laboratory to industrial application for domestic EUV light sources, company representatives estimate that mass production is still 3 to 5 years away. Key challenges remain in increasing output power and ensuring long-term operational stability. Commercial EUV lithography systems require hundreds of watts of output power and high reliability during extended operation. The prototype validates the technical feasibility but still has a significant gap to achieve the product maturity needed for industrial use.