Fraunhofer develops PFAS-free membrane for semiconductor processing

Scientists at the Fraunhofer Institute for Applied Polymer Research IAP in Potsdam have successfully created a PFAS-free polymer membrane for use in semiconductor manufacturing. This development addresses the growing concerns regarding the environmental and health impacts of PFAS chemicals, which are widely used in the industry.

PFAS substances, valued for their stability and resistance, are employed in various semiconductor processes, including filtration and etching. A proposed European ban on PFAS has prompted the industry to search for viable alternatives. The new membrane, based on polyacrylonitrile (PAN), is noted for its chemical and mechanical stability, featuring a pore diameter of approximately seven nanometers. This allows for the effective removal of very fine particulate contaminants that can interfere with the production of advanced semiconductors.

"Chip manufacturing involves numerous steps that generate particulate contaminants. These must be separated to prevent defects in nanometer-sized structures," explained Dr. Murat Tutus, head of the "Membranes and functional films" department at Fraunhofer IAP. He highlighted that the membrane's ability to filter particles down to seven nanometers represents a finer level of filtration compared to medical sterile filters (220 nanometers).

The production process for the new membrane utilizes REACH-compliant solvents and low temperatures, contributing to its sustainable profile. Researchers can also customize the membrane's pore size and permeability to meet specific application requirements. This adaptability facilitates integration into existing production systems with minimal modification, positioning it as an attractive option for the semiconductor industry and potentially other sectors like pharmaceuticals and chemicals.