Huayang Precision and Zeiss Launch Semiconductor Measurement Equipment
Taiwanese semiconductor equipment maker Huayang Precision, in partnership with Zeiss, has introduced the COSMA-M measurement system, designed for high-precision tasks in the semiconductor industry.
Taiwanese semiconductor equipment manufacturer Huayang Precision announced on October 5th the launch of its COSMA-M measurement system, developed in collaboration with Germany's Zeiss. The new equipment targets demanding measurement needs within the semiconductor sector, specifically for photomask production, advanced packaging, and wafer fabrication.
The COSMA-M system is engineered to deliver measurement precision at the nanometer level, achieving a stability of 3σ less than 3 nanometers. This level of accuracy is critical for meeting the stringent requirements of advanced semiconductor manufacturing processes. The system can be equipped with complementary modules to enable fully automated measurement workflows.
Applications for the COSMA-M span areas such as Deep Ultraviolet (DUV) photomasks, advanced packaging technologies, Through-Glass Vias (TGV), and Co-Packaged Optics (CPO). Huayang Precision has already initiated sample validation tests with potential customers.
The introduction of COSMA-M addresses the semiconductor industry's increasing demand for enhanced precision and automation throughout its production chain. The collaboration with Zeiss, a recognized leader in optics and measurement technology, underscores Huayang Precision's commitment to providing sophisticated solutions.