Rheinmetall Subsidiary Secures Funding for New Capacitor Development
Rheinmetall's subsidiary, Pierburg Pump Technology, will receive approximately 1.5 million euros in funding for its Hartha facility. The funds will support the development of production processes for high-performance NanoLam™ capacitors.
Hartha, Germany – Pierburg Pump Technology GmbH, a subsidiary of the Rheinmetall technology group, has secured approximately 1.5 million euros in funding for its site in Hartha, Saxony. The funding, co-financed by the European Regional Development Fund (ERDF) and state budget revenues, supports the NanoLink project. The project aims to develop innovative production processes and analytical methods for manufacturing high-performance NanoLam™ capacitors.
These capacitors are identified as key components for next-generation electric vehicle powertrains. They offer advantages over conventional capacitors, including higher capacitance density, lower weight for equivalent capacitance, improved temperature resistance, and better dielectric strength and thermal conductivity. The Hartha facility will house Europe's first demonstration facility for the production of these NanoLam™ capacitors.
The NanoLink project will focus on systematically advancing individual process steps for large-scale production. Emphasis will be placed on cost-effectiveness, energy efficiency, and automation, while maintaining quality and reliability, with the goal of making the technology accessible to the wider market.
Project partners include AKON GmbH, Chemnitz University of Technology, and the Laser Institute at the University of Applied Sciences Mittweida. The collaboration aims to strengthen the regional economy, enhance supply chain resilience, and position Germany as a key player in electric mobility component production in Europe. The Hartha site, part of Rheinmetall for over 30 years, has a history of innovation, previously developing products like electric water circulation pumps and high-voltage coolant pumps for fuel cell applications.